Awọn itumọ ọrọ sisọ:

HAFNIUM(+4)Oxide;HAFNIUM Oxide;HAFNIUM(IV) OXIDE;Hafnium(IV) oxide sputtering target, 101.4mm (4.0in) dia x 6.35mm (0.25in) nipọn, 99.95% (ipilẹ awọn irin laisi Zr);Haf (IV) oxide sputtering afojusun, 101.4mm (4.0 in.) dia.x 6.35mm (0.25 in.) nipọn

SILES Canonical:O=[Hf]=O

Koodu HS:28259085

Ìwúwo:9.68 g/ml ni 25°C(tan.)

Atọka Refractive:2.13(1700nm)

Oju Iyọ:2810°C

Ìfarahàn:lulú

Awọn Gbólóhùn Aabo:22-24/25

WGK Germany:3