Mantsoe a tšoanang:

HAFNIUM(+4)OXIDE;HAFNIUM OXIDE;HAFNIUM(IV) OXIDE;Hafnium(IV) oxide sputtering target, 101.4mm (4.0in) dia x 6.35mm (0.25in) botenya, 99.95% (metals basis); Hafnium motheo oa tšepe e sa kenyeletsoe); (IV) oxide sputtering target, 101.4mm (4.0 in.) dia.x 6.35mm (0.25 in.) botenya

Canonical SMILES:O=[Hf]=O

Khoutu ea HS:28259085

Tekano:9.68 g/mL ho25 °C(lit.)

Refractive Index:2.13(1700nm)

Melting Point:2810°C

Ponahalo:phofo

Lipolelo tsa Tšireletseho:22-24/25

WGK Jeremane:3